Spectroscopic Studies of Magnetron Sputtering Plasma Discharge in Cu/O2/Ar Mixture for Copper Oxide Thin Film Fabrication
Magnetron sputtering plasma for the deposition of copper oxide thin film has been investigated using optical emission spectroscopy and Langmuir probe. The intensity of the light emission from atoms and radicals in the plasma were measured using optical emission spectroscopy (OES). Then, Langmuir pro...
| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Penerbit Universiti Teknologi Malaysia
2015
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| Subjects: | |
| Online Access: | http://umpir.ump.edu.my/id/eprint/8790/ http://umpir.ump.edu.my/id/eprint/8790/ http://umpir.ump.edu.my/id/eprint/8790/ http://umpir.ump.edu.my/id/eprint/8790/1/Spectroscopic%20Studies%20of%20Magnetron%20Sputtering%20Plasma%20Discharge%20in%20Cu%20O2%20Ar%20Mixture%20for%20Copper%20Oxide%20Thin%20Film%20Fabrication.pdf |
Internet
http://umpir.ump.edu.my/id/eprint/8790/http://umpir.ump.edu.my/id/eprint/8790/
http://umpir.ump.edu.my/id/eprint/8790/
http://umpir.ump.edu.my/id/eprint/8790/1/Spectroscopic%20Studies%20of%20Magnetron%20Sputtering%20Plasma%20Discharge%20in%20Cu%20O2%20Ar%20Mixture%20for%20Copper%20Oxide%20Thin%20Film%20Fabrication.pdf