Photo-polishing of POME into CH4-Lean Biogas over The UV-Responsive ZnO Photocatalyst

We report here the photo-polishing of POME with a concomitant production of CH4-lean biogas over UV/ZnO photocatalysis system. The photoreaction results showed that the optimum ZnO loading for POME photomineralization was 1.0 g/L, with about 50% of COD removal after just 240 min of UV irradiation...

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Main Authors:	Ng, Kim Hoong, Cheng, C. K.
Format:	Article
Language:	English English
Published:	Elsevier 2016
Subjects:	TP Chemical technology
Online Access:	http://umpir.ump.edu.my/id/eprint/12990/ http://umpir.ump.edu.my/id/eprint/12990/ http://umpir.ump.edu.my/id/eprint/12990/1/UMP-IR-Chem-Eng%20J.pdf http://umpir.ump.edu.my/id/eprint/12990/7/Photo-polishing%20of%20POME%20into%20CH4-lean%20biogas%20over%20the%20UV-responsive%20ZnO%20photocatalyst.pdf

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recordtype	eprints
spelling	ump-129902018-01-10T06:59:06Z http://umpir.ump.edu.my/id/eprint/12990/ Photo-polishing of POME into CH4-Lean Biogas over The UV-Responsive ZnO Photocatalyst Ng, Kim Hoong Cheng, C. K. TP Chemical technology We report here the photo-polishing of POME with a concomitant production of CH4-lean biogas over UV/ZnO photocatalysis system. The photoreaction results showed that the optimum ZnO loading for POME photomineralization was 1.0 g/L, with about 50% of COD removal after just 240 min of UV irradiation. It is found that all the photomineralization kinetics can be modelled to the 1st-order reaction order, with specific reaction rates (k)ranging from 1.022 × 10-3 to 3.118 × 10-3 min-1. The highest amount of gaseous products, viz. 36,172 µmol of CO2and 333 µmol of CH4, were produced at this optimum loading. Significantly, the organic removal efficiency was further enhanced when the UV exposure was prolonged to 22 h, attaining final readings of 44 ppm, 26 ppm and 20 mg/L, respectively, for chemical oxygen demand (COD), biochemical oxygen demand (BOD) and oil and grease (O&G). Furthermore, our scavenging study suggests that the photomineralization of organic pollutants in the POME occurred via attack by the highly reactive OH• radical. In addition, we posit that the reaction took place on the surface of ZnO2 upon the adsorption of the organic pollutants. Our proposition was further confirmed by the presence of carbonaceous species on the surface of ZnO through a combination of spectroscopic probes, i.e. FTIR, SEM-EDX, as well as the deterioration in the BET specific surface area for the used ZnO photocatalyst. The plunge of ZnO’s photodegradation performance was observed in the recyclability test. The performance has plummeted from 50% to 35% in second cycle before stabilizing at 38% in the third cycle. This can be attributed to the blockage of surface area of ZnO by the deposited organic species. Elsevier 2016-04-23 Article PeerReviewed application/pdf en http://umpir.ump.edu.my/id/eprint/12990/1/UMP-IR-Chem-Eng%20J.pdf application/pdf en http://umpir.ump.edu.my/id/eprint/12990/7/Photo-polishing%20of%20POME%20into%20CH4-lean%20biogas%20over%20the%20UV-responsive%20ZnO%20photocatalyst.pdf Ng, Kim Hoong and Cheng, C. K. (2016) Photo-polishing of POME into CH4-Lean Biogas over The UV-Responsive ZnO Photocatalyst. Chemical Engineering Journal. ISSN 1385-8947 (In Press) http://dx.doi.org/10.1016/j.cej.2016.04.105
repository_type	Digital Repository
institution_category	Local University
institution	Universiti Malaysia Pahang
building	UMP Institutional Repository
collection	Online Access
language	English English
topic	TP Chemical technology
spellingShingle	TP Chemical technology Ng, Kim Hoong Cheng, C. K. Photo-polishing of POME into CH4-Lean Biogas over The UV-Responsive ZnO Photocatalyst
description	We report here the photo-polishing of POME with a concomitant production of CH4-lean biogas over UV/ZnO photocatalysis system. The photoreaction results showed that the optimum ZnO loading for POME photomineralization was 1.0 g/L, with about 50% of COD removal after just 240 min of UV irradiation. It is found that all the photomineralization kinetics can be modelled to the 1st-order reaction order, with specific reaction rates (k)ranging from 1.022 × 10-3 to 3.118 × 10-3 min-1. The highest amount of gaseous products, viz. 36,172 µmol of CO2and 333 µmol of CH4, were produced at this optimum loading. Significantly, the organic removal efficiency was further enhanced when the UV exposure was prolonged to 22 h, attaining final readings of 44 ppm, 26 ppm and 20 mg/L, respectively, for chemical oxygen demand (COD), biochemical oxygen demand (BOD) and oil and grease (O&G). Furthermore, our scavenging study suggests that the photomineralization of organic pollutants in the POME occurred via attack by the highly reactive OH• radical. In addition, we posit that the reaction took place on the surface of ZnO2 upon the adsorption of the organic pollutants. Our proposition was further confirmed by the presence of carbonaceous species on the surface of ZnO through a combination of spectroscopic probes, i.e. FTIR, SEM-EDX, as well as the deterioration in the BET specific surface area for the used ZnO photocatalyst. The plunge of ZnO’s photodegradation performance was observed in the recyclability test. The performance has plummeted from 50% to 35% in second cycle before stabilizing at 38% in the third cycle. This can be attributed to the blockage of surface area of ZnO by the deposited organic species.
format	Article
author	Ng, Kim Hoong Cheng, C. K.
author_facet	Ng, Kim Hoong Cheng, C. K.
author_sort	Ng, Kim Hoong
title	Photo-polishing of POME into CH4-Lean Biogas over The UV-Responsive ZnO Photocatalyst
title_short	Photo-polishing of POME into CH4-Lean Biogas over The UV-Responsive ZnO Photocatalyst
title_full	Photo-polishing of POME into CH4-Lean Biogas over The UV-Responsive ZnO Photocatalyst
title_fullStr	Photo-polishing of POME into CH4-Lean Biogas over The UV-Responsive ZnO Photocatalyst
title_full_unstemmed	Photo-polishing of POME into CH4-Lean Biogas over The UV-Responsive ZnO Photocatalyst
title_sort	photo-polishing of pome into ch4-lean biogas over the uv-responsive zno photocatalyst
publisher	Elsevier
publishDate	2016
url	http://umpir.ump.edu.my/id/eprint/12990/ http://umpir.ump.edu.my/id/eprint/12990/ http://umpir.ump.edu.my/id/eprint/12990/1/UMP-IR-Chem-Eng%20J.pdf http://umpir.ump.edu.my/id/eprint/12990/7/Photo-polishing%20of%20POME%20into%20CH4-lean%20biogas%20over%20the%20UV-responsive%20ZnO%20photocatalyst.pdf
first_indexed	2023-09-18T22:15:06Z
last_indexed	2023-09-18T22:15:06Z
_version_	1777415284666138624

Photo-polishing of POME into CH4-Lean Biogas over The UV-Responsive ZnO Photocatalyst

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