Photo-polishing of POME into CH4-Lean Biogas over The UV-Responsive ZnO Photocatalyst
We report here the photo-polishing of POME with a concomitant production of CH4-lean biogas over UV/ZnO photocatalysis system. The photoreaction results showed that the optimum ZnO loading for POME photomineralization was 1.0 g/L, with about 50% of COD removal after just 240 min of UV irradiation...
| Main Authors: | , |
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| Format: | Article |
| Language: | English English |
| Published: |
Elsevier
2016
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| Subjects: | |
| Online Access: | http://umpir.ump.edu.my/id/eprint/12990/ http://umpir.ump.edu.my/id/eprint/12990/ http://umpir.ump.edu.my/id/eprint/12990/1/UMP-IR-Chem-Eng%20J.pdf http://umpir.ump.edu.my/id/eprint/12990/7/Photo-polishing%20of%20POME%20into%20CH4-lean%20biogas%20over%20the%20UV-responsive%20ZnO%20photocatalyst.pdf |
Internet
http://umpir.ump.edu.my/id/eprint/12990/http://umpir.ump.edu.my/id/eprint/12990/
http://umpir.ump.edu.my/id/eprint/12990/1/UMP-IR-Chem-Eng%20J.pdf
http://umpir.ump.edu.my/id/eprint/12990/7/Photo-polishing%20of%20POME%20into%20CH4-lean%20biogas%20over%20the%20UV-responsive%20ZnO%20photocatalyst.pdf