Characterizations of cupric oxide thin films on glass and silicon substrates by radio frequency magnetron sputtering

Cupric oxide (CuO) thin films were prepared on a glass and silicon (Si) substrates by radio frequency magnetron sputtering system. The structural, optical and electrical properties of CuO films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), Fourier transform infrared s...

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Main Authors:	P.K., Ooi, C.G., Ching, M.A., Ahmad, S.S., Ng, M.J., Abdullah, H., Abu Hassan, Z., Hassan
Format:	Article
Language:	English
Published:	Universiti Kebangsaan Malaysia 2014
Online Access:	http://journalarticle.ukm.my/7057/ http://journalarticle.ukm.my/7057/ http://journalarticle.ukm.my/7057/1/16_P.K._Ooi.pdf

id	ukm-7057
recordtype	eprints
spelling	ukm-70572016-12-14T06:42:59Z http://journalarticle.ukm.my/7057/ Characterizations of cupric oxide thin films on glass and silicon substrates by radio frequency magnetron sputtering P.K., Ooi C.G., Ching M.A., Ahmad S.S., Ng M.J., Abdullah H., Abu Hassan Z., Hassan Cupric oxide (CuO) thin films were prepared on a glass and silicon (Si) substrates by radio frequency magnetron sputtering system. The structural, optical and electrical properties of CuO films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), Fourier transform infrared spectrometer, ultra-violet visible spectrophotometer, respectively, four point probe techniques and Keithley 4200 semiconductor characterization system. The XRD result showed that single phase CuO thin films with monoclinic structure were obtained. AFM showed well organized nano-pillar morphology with root mean square surface roughness for CuO thin films on glass and Si substrates were 3.64 and 1.91 nm, respectively. Infrared reflectance spectra shown a single reflection peak which is corresponding to CuO optical phonon mode and it confirmed that only existence of CuO composition on both substrates. The optical direct band gap energy of the CuO film grown on glass substrate, which is calculated from the optical transmission measurement was 1.37 eV. Finally, it was found that the deposited CuO films are resistive and the palladium formed ohmic contact for CuO on glass and schottky contact for CuO on Si. Universiti Kebangsaan Malaysia 2014-04 Article PeerReviewed application/pdf en http://journalarticle.ukm.my/7057/1/16_P.K._Ooi.pdf P.K., Ooi and C.G., Ching and M.A., Ahmad and S.S., Ng and M.J., Abdullah and H., Abu Hassan and Z., Hassan (2014) Characterizations of cupric oxide thin films on glass and silicon substrates by radio frequency magnetron sputtering. Sains Malaysiana, 43 (4). pp. 617-621. ISSN 0126-6039 http://www.ukm.my/jsm/
repository_type	Digital Repository
institution_category	Local University
institution	Universiti Kebangasaan Malaysia
building	UKM Institutional Repository
collection	Online Access
language	English
description	Cupric oxide (CuO) thin films were prepared on a glass and silicon (Si) substrates by radio frequency magnetron sputtering system. The structural, optical and electrical properties of CuO films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), Fourier transform infrared spectrometer, ultra-violet visible spectrophotometer, respectively, four point probe techniques and Keithley 4200 semiconductor characterization system. The XRD result showed that single phase CuO thin films with monoclinic structure were obtained. AFM showed well organized nano-pillar morphology with root mean square surface roughness for CuO thin films on glass and Si substrates were 3.64 and 1.91 nm, respectively. Infrared reflectance spectra shown a single reflection peak which is corresponding to CuO optical phonon mode and it confirmed that only existence of CuO composition on both substrates. The optical direct band gap energy of the CuO film grown on glass substrate, which is calculated from the optical transmission measurement was 1.37 eV. Finally, it was found that the deposited CuO films are resistive and the palladium formed ohmic contact for CuO on glass and schottky contact for CuO on Si.
format	Article
author	P.K., Ooi C.G., Ching M.A., Ahmad S.S., Ng M.J., Abdullah H., Abu Hassan Z., Hassan
spellingShingle	P.K., Ooi C.G., Ching M.A., Ahmad S.S., Ng M.J., Abdullah H., Abu Hassan Z., Hassan Characterizations of cupric oxide thin films on glass and silicon substrates by radio frequency magnetron sputtering
author_facet	P.K., Ooi C.G., Ching M.A., Ahmad S.S., Ng M.J., Abdullah H., Abu Hassan Z., Hassan
author_sort	P.K., Ooi
title	Characterizations of cupric oxide thin films on glass and silicon substrates by radio frequency magnetron sputtering
title_short	Characterizations of cupric oxide thin films on glass and silicon substrates by radio frequency magnetron sputtering
title_full	Characterizations of cupric oxide thin films on glass and silicon substrates by radio frequency magnetron sputtering
title_fullStr	Characterizations of cupric oxide thin films on glass and silicon substrates by radio frequency magnetron sputtering
title_full_unstemmed	Characterizations of cupric oxide thin films on glass and silicon substrates by radio frequency magnetron sputtering
title_sort	characterizations of cupric oxide thin films on glass and silicon substrates by radio frequency magnetron sputtering
publisher	Universiti Kebangsaan Malaysia
publishDate	2014
url	http://journalarticle.ukm.my/7057/ http://journalarticle.ukm.my/7057/ http://journalarticle.ukm.my/7057/1/16_P.K._Ooi.pdf
first_indexed	2023-09-18T19:48:38Z
last_indexed	2023-09-18T19:48:38Z
_version_	1777406069768716288

Characterizations of cupric oxide thin films on glass and silicon substrates by radio frequency magnetron sputtering

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