Effects of rf power on structural properties of Nc-Si:H thin films deposited by layer-by-layer (LbL) deposition technique
The effects of rf power on the structural properties of hydrogenated nanocrystalline silicon (nc-Si:H) thin films deposited using layer-by-layer (LbL) deposition technique in a home-built plasma enhanced chemical vapor deposition (PECVD) system were investigated. The properties of the films were cha...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
Universiti Kebangsaan Malaysia
2012
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| Online Access: | http://journalarticle.ukm.my/5420/ http://journalarticle.ukm.my/5420/ http://journalarticle.ukm.my/5420/1/08%2520Goh%2520Boon.pdf |