Lifetime Amelioration of Antireflection Structure Molds by Means of Partial-filling Ultraviolet Nanoimprint Lithography

Lifetime Amelioration of Antireflection Structure Molds by Means of Partial-filling Ultraviolet Nanoimprint Lithography

Release coating layer (RCL) becomes an important element in ultraviolet nanoimprint lithography (UVNIL) for preventing the adhesive resin from adhering to the surface of antireflection structures (ARS) mold. However, complete filling the resin of a high-aspect-ratio ARS mold during UV-NIL generates...

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Main Authors: Nurhafizah, Abu Talip, Hayashi, Tatsuya, Taniguchi, Jun, Hiwasa, Shin
Format: Article
Language:English
Published: Elsevier Ltd 2015
Subjects:
TK Electrical engineering. Electronics Nuclear engineering
Online Access:http://umpir.ump.edu.my/id/eprint/8811/
http://umpir.ump.edu.my/id/eprint/8811/
http://umpir.ump.edu.my/id/eprint/8811/
http://umpir.ump.edu.my/id/eprint/8811/1/fkee-2015-Nurhafizah-Lifetime%20Amelioration-abs.pdf
id ump-8811
recordtype eprints
spelling ump-88112018-06-28T01:06:33Z http://umpir.ump.edu.my/id/eprint/8811/ Lifetime Amelioration of Antireflection Structure Molds by Means of Partial-filling Ultraviolet Nanoimprint Lithography Nurhafizah, Abu Talip Hayashi, Tatsuya Taniguchi, Jun Hiwasa, Shin TK Electrical engineering. Electronics Nuclear engineering Release coating layer (RCL) becomes an important element in ultraviolet nanoimprint lithography (UVNIL) for preventing the adhesive resin from adhering to the surface of antireflection structures (ARS) mold. However, complete filling the resin of a high-aspect-ratio ARS mold during UV-NIL generates a strong release force (RF) that deteriorates the RCL and affects the lifetime of the ARS mold. In this paper, we proposed a technique of partial-filling UV-NIL in order to reduce the RF and consequently, ameliorate the lifetime of the ARS mold. The release and optical properties of the ARS were measured to determine the lifetime of the mold, and complete-filling UV-NIL was also executed for comparison. By means of partial-filling UV-NIL, we successfully fabricated ARS films with excellent performance up to the 150th imprint, i.e., reflectivity of 0.25 ± 0.15% and transmittance of 94.0 ± 0.50% at visible wavelengths, compared to complete-filling UV-NIL up to the 50th imprint. Elsevier Ltd 2015 Article PeerReviewed application/pdf en http://umpir.ump.edu.my/id/eprint/8811/1/fkee-2015-Nurhafizah-Lifetime%20Amelioration-abs.pdf Nurhafizah, Abu Talip and Hayashi, Tatsuya and Taniguchi, Jun and Hiwasa, Shin (2015) Lifetime Amelioration of Antireflection Structure Molds by Means of Partial-filling Ultraviolet Nanoimprint Lithography. Microelectronic Engineering, 141. pp. 81-86. ISSN 0167-9317 http://dx.doi.org/10.1016/j.mee.2015.01.035 DOI: 10.1016/j.mee.2015.01.035
repository_type Digital Repository
institution_category Local University
institution Universiti Malaysia Pahang
building UMP Institutional Repository
collection Online Access
language English
topic TK Electrical engineering. Electronics Nuclear engineering
spellingShingle TK Electrical engineering. Electronics Nuclear engineering
Nurhafizah, Abu Talip
Hayashi, Tatsuya
Taniguchi, Jun
Hiwasa, Shin
Lifetime Amelioration of Antireflection Structure Molds by Means of Partial-filling Ultraviolet Nanoimprint Lithography
description Release coating layer (RCL) becomes an important element in ultraviolet nanoimprint lithography (UVNIL) for preventing the adhesive resin from adhering to the surface of antireflection structures (ARS) mold. However, complete filling the resin of a high-aspect-ratio ARS mold during UV-NIL generates a strong release force (RF) that deteriorates the RCL and affects the lifetime of the ARS mold. In this paper, we proposed a technique of partial-filling UV-NIL in order to reduce the RF and consequently, ameliorate the lifetime of the ARS mold. The release and optical properties of the ARS were measured to determine the lifetime of the mold, and complete-filling UV-NIL was also executed for comparison. By means of partial-filling UV-NIL, we successfully fabricated ARS films with excellent performance up to the 150th imprint, i.e., reflectivity of 0.25 ± 0.15% and transmittance of 94.0 ± 0.50% at visible wavelengths, compared to complete-filling UV-NIL up to the 50th imprint.
format Article
author Nurhafizah, Abu Talip
Hayashi, Tatsuya
Taniguchi, Jun
Hiwasa, Shin
author_facet Nurhafizah, Abu Talip
Hayashi, Tatsuya
Taniguchi, Jun
Hiwasa, Shin
author_sort Nurhafizah, Abu Talip
title Lifetime Amelioration of Antireflection Structure Molds by Means of Partial-filling Ultraviolet Nanoimprint Lithography
title_short Lifetime Amelioration of Antireflection Structure Molds by Means of Partial-filling Ultraviolet Nanoimprint Lithography
title_full Lifetime Amelioration of Antireflection Structure Molds by Means of Partial-filling Ultraviolet Nanoimprint Lithography
title_fullStr Lifetime Amelioration of Antireflection Structure Molds by Means of Partial-filling Ultraviolet Nanoimprint Lithography
title_full_unstemmed Lifetime Amelioration of Antireflection Structure Molds by Means of Partial-filling Ultraviolet Nanoimprint Lithography
title_sort lifetime amelioration of antireflection structure molds by means of partial-filling ultraviolet nanoimprint lithography
publisher Elsevier Ltd
publishDate 2015
url http://umpir.ump.edu.my/id/eprint/8811/
http://umpir.ump.edu.my/id/eprint/8811/
http://umpir.ump.edu.my/id/eprint/8811/
http://umpir.ump.edu.my/id/eprint/8811/1/fkee-2015-Nurhafizah-Lifetime%20Amelioration-abs.pdf
first_indexed 2023-09-18T22:06:47Z
last_indexed 2023-09-18T22:06:47Z
_version_ 1777414761869213696

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