Effect of surface pretreatments on the deposition of polycrystalline diamond on silicon nitride substrates using hot filament chemical vapor deposition method

The deposition of diamond films on a silicon nitride (Si3N4) substrate is an attractive technique for industrial applications because of the excellent properties of diamond.Diamond possesses remarkable physical and mechanical properties such as chemical resistant,extreme hardness and highly wears re...

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Main Author: Dayangku Noorfazidah, Awang Sh'ri
Format: Thesis
Language:English
Published: 2009
Subjects:
Online Access:http://umpir.ump.edu.my/id/eprint/3853/
http://umpir.ump.edu.my/id/eprint/3853/
http://umpir.ump.edu.my/id/eprint/3853/1/DAYANGKU_NOORFAZIDAH_B_I_AWANG_SH_RI.PDF
id ump-3853
recordtype eprints
spelling ump-38532017-08-17T06:50:05Z http://umpir.ump.edu.my/id/eprint/3853/ Effect of surface pretreatments on the deposition of polycrystalline diamond on silicon nitride substrates using hot filament chemical vapor deposition method Dayangku Noorfazidah, Awang Sh'ri TA Engineering (General). Civil engineering (General) The deposition of diamond films on a silicon nitride (Si3N4) substrate is an attractive technique for industrial applications because of the excellent properties of diamond.Diamond possesses remarkable physical and mechanical properties such as chemical resistant,extreme hardness and highly wears resistant.Pretreatment of substrate is very important prior to diamond deposition to promote nucleation and adhesion between coating and substrate. Polycrystalline diamonds films have been deposited on silicon nitride substrate by Hot Filament Chemical Vapor Deposition (HF-CVD)method.The Si 3N4 substrates have been subjected to various pretreatment methods prior to diamond deposition namely chemical etching and mechanical abrasion.The structure and morphology of diamond coating have been studied using X-ray Diffraction (XRD) and Scanning Electron Microscopy (SEM) while diamond film quality has been characterized using Raman spectroscopy.The adhesion of diamond films has been determined qualitatively by using Vickers hardness tester.It was found that the diamond films formed on chemical pretreated substrates has cauliflower morphology and low adhesive strength but also have low surface roughness.Substrates that pretreated with sand blasting have yield diamond film with well-facetted morphology with high crystallinity and better adhesion. However,the surface roughness of the diamond film deposited on substrates pretreated with blasting are also higher. 2009-05 Thesis NonPeerReviewed application/pdf en http://umpir.ump.edu.my/id/eprint/3853/1/DAYANGKU_NOORFAZIDAH_B_I_AWANG_SH_RI.PDF Dayangku Noorfazidah, Awang Sh'ri (2009) Effect of surface pretreatments on the deposition of polycrystalline diamond on silicon nitride substrates using hot filament chemical vapor deposition method. Masters thesis, Universiti Teknologi Malaysia. http://iportal.ump.edu.my/lib/item?id=chamo:59166&theme=UMP2
repository_type Digital Repository
institution_category Local University
institution Universiti Malaysia Pahang
building UMP Institutional Repository
collection Online Access
language English
topic TA Engineering (General). Civil engineering (General)
spellingShingle TA Engineering (General). Civil engineering (General)
Dayangku Noorfazidah, Awang Sh'ri
Effect of surface pretreatments on the deposition of polycrystalline diamond on silicon nitride substrates using hot filament chemical vapor deposition method
description The deposition of diamond films on a silicon nitride (Si3N4) substrate is an attractive technique for industrial applications because of the excellent properties of diamond.Diamond possesses remarkable physical and mechanical properties such as chemical resistant,extreme hardness and highly wears resistant.Pretreatment of substrate is very important prior to diamond deposition to promote nucleation and adhesion between coating and substrate. Polycrystalline diamonds films have been deposited on silicon nitride substrate by Hot Filament Chemical Vapor Deposition (HF-CVD)method.The Si 3N4 substrates have been subjected to various pretreatment methods prior to diamond deposition namely chemical etching and mechanical abrasion.The structure and morphology of diamond coating have been studied using X-ray Diffraction (XRD) and Scanning Electron Microscopy (SEM) while diamond film quality has been characterized using Raman spectroscopy.The adhesion of diamond films has been determined qualitatively by using Vickers hardness tester.It was found that the diamond films formed on chemical pretreated substrates has cauliflower morphology and low adhesive strength but also have low surface roughness.Substrates that pretreated with sand blasting have yield diamond film with well-facetted morphology with high crystallinity and better adhesion. However,the surface roughness of the diamond film deposited on substrates pretreated with blasting are also higher.
format Thesis
author Dayangku Noorfazidah, Awang Sh'ri
author_facet Dayangku Noorfazidah, Awang Sh'ri
author_sort Dayangku Noorfazidah, Awang Sh'ri
title Effect of surface pretreatments on the deposition of polycrystalline diamond on silicon nitride substrates using hot filament chemical vapor deposition method
title_short Effect of surface pretreatments on the deposition of polycrystalline diamond on silicon nitride substrates using hot filament chemical vapor deposition method
title_full Effect of surface pretreatments on the deposition of polycrystalline diamond on silicon nitride substrates using hot filament chemical vapor deposition method
title_fullStr Effect of surface pretreatments on the deposition of polycrystalline diamond on silicon nitride substrates using hot filament chemical vapor deposition method
title_full_unstemmed Effect of surface pretreatments on the deposition of polycrystalline diamond on silicon nitride substrates using hot filament chemical vapor deposition method
title_sort effect of surface pretreatments on the deposition of polycrystalline diamond on silicon nitride substrates using hot filament chemical vapor deposition method
publishDate 2009
url http://umpir.ump.edu.my/id/eprint/3853/
http://umpir.ump.edu.my/id/eprint/3853/
http://umpir.ump.edu.my/id/eprint/3853/1/DAYANGKU_NOORFAZIDAH_B_I_AWANG_SH_RI.PDF
first_indexed 2023-09-18T21:58:24Z
last_indexed 2023-09-18T21:58:24Z
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