Photo-polishing of palm oil mill effluent (POME) over UV/ZnO system
The photo-polishing of POME over UV /'ZnO photocatalysis system was performed in current study. The ZnO material, with band gap energy of 3.2 eV from our UV-Vis DRS measurement, was proven responsive towards 100 W UV-irradiation of 365 nm wavelength. The effect of ZnO loading was investigated B...
| Main Authors: | , |
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| Format: | Conference or Workshop Item |
| Language: | English |
| Published: |
2016
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| Subjects: | |
| Online Access: | http://umpir.ump.edu.my/id/eprint/17069/ http://umpir.ump.edu.my/id/eprint/17069/1/Photo-polishing%20of%20Palm%20Oil%20Mill%20Effluent%20%28POME%29%20over%20UVZnO%20System.pdf |
| Summary: | The photo-polishing of POME over UV /'ZnO photocatalysis system was performed in current study. The ZnO material, with band gap energy of 3.2 eV from our UV-Vis DRS measurement, was proven responsive towards 100 W UV-irradiation of 365 nm wavelength. The effect of ZnO loading was investigated Based on the results obtained, the optimum ZnO loading for POME photomineralization was 1.0 g/L, with about 50% of COD removal recorded after 240 min of UV irradiation. It is found that all the photomineralization kinetics for all the photoreaction followed the 1st-order reaction with specific reaction rates (k) ranging froml.022 x10-3 to 3.118 x10-3 min-1 • Significantly, the organic removal efficiency was further enhanced when UV exposure was prolonged to 22 h, attaining final readings of 44 ppm of chemical oxygen demand (COD) level. |
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