Contact Pressure Distribution During the Polishing Process of Ceramic Tiles: A Laboratory Investigation

During the polishing process of porcelain tiles the difference in scratching speed between innermost and peripheral abrasives leads to pressure gradients linearly distributed along the radial direction of the abrasive tool. The aim of this paper is to investigate such pressure gradient in laboratory...

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Main Authors:	A. S. A., Sani, F. J. P., Sousa, Zamzuri, Hamedon, Azmir, Azhari
Format:	Conference or Workshop Item
Language:	English
Published:	IOP Publishing 2016
Subjects:	TS Manufactures
Online Access:	http://umpir.ump.edu.my/id/eprint/14756/ http://umpir.ump.edu.my/id/eprint/14756/ http://umpir.ump.edu.my/id/eprint/14756/ http://umpir.ump.edu.my/id/eprint/14756/1/fkp-2016-asas-contact%20pressure%20distribution%20during%20the%20polishing.pdf

id	ump-14756
recordtype	eprints
spelling	ump-147562018-02-27T01:18:00Z http://umpir.ump.edu.my/id/eprint/14756/ Contact Pressure Distribution During the Polishing Process of Ceramic Tiles: A Laboratory Investigation A. S. A., Sani F. J. P., Sousa Zamzuri, Hamedon Azmir, Azhari TS Manufactures During the polishing process of porcelain tiles the difference in scratching speed between innermost and peripheral abrasives leads to pressure gradients linearly distributed along the radial direction of the abrasive tool. The aim of this paper is to investigate such pressure gradient in laboratory scale. For this purpose polishing tests were performed on ceramic tiles according to the industrial practices using a custom-made CNC tribometer. Gradual wear on both abrasives and machined surface of the floor tile were measured. The experimental results suggested that the pressure gradient tends to cause an inclination of the abraded surfaces, which becomes stable after a given polishing period. In addition to the wear depth of the machined surface, the highest value of gloss and finest surface finish were observed at the lowest point of the worn out surface of the ceramic floor tile corresponding to the point of highest pressure and lowest scratching speed. IOP Publishing 2016 Conference or Workshop Item PeerReviewed application/pdf en cc_by http://umpir.ump.edu.my/id/eprint/14756/1/fkp-2016-asas-contact%20pressure%20distribution%20during%20the%20polishing.pdf A. S. A., Sani and F. J. P., Sousa and Zamzuri, Hamedon and Azmir, Azhari (2016) Contact Pressure Distribution During the Polishing Process of Ceramic Tiles: A Laboratory Investigation. In: IOP Conference Series: Materials Science and Engineering: 2nd International Manufacturing Engineering Conference and 3rd Asia-Pacific Conference on Manufacturing Systems (iMEC-APCOMS 2015), 12–14 November 2015 , Kuala Lumpur, Malaysia. pp. 1-19., 114 (012008). ISSN 1757-8981 (Print), 1757-899X (Online) http://dx.doi.org/10.1088/1757-899X/114/1/012008 doi:10.1088/1757-899X/114/1/012008
repository_type	Digital Repository
institution_category	Local University
institution	Universiti Malaysia Pahang
building	UMP Institutional Repository
collection	Online Access
language	English
topic	TS Manufactures
spellingShingle	TS Manufactures A. S. A., Sani F. J. P., Sousa Zamzuri, Hamedon Azmir, Azhari Contact Pressure Distribution During the Polishing Process of Ceramic Tiles: A Laboratory Investigation
description	During the polishing process of porcelain tiles the difference in scratching speed between innermost and peripheral abrasives leads to pressure gradients linearly distributed along the radial direction of the abrasive tool. The aim of this paper is to investigate such pressure gradient in laboratory scale. For this purpose polishing tests were performed on ceramic tiles according to the industrial practices using a custom-made CNC tribometer. Gradual wear on both abrasives and machined surface of the floor tile were measured. The experimental results suggested that the pressure gradient tends to cause an inclination of the abraded surfaces, which becomes stable after a given polishing period. In addition to the wear depth of the machined surface, the highest value of gloss and finest surface finish were observed at the lowest point of the worn out surface of the ceramic floor tile corresponding to the point of highest pressure and lowest scratching speed.
format	Conference or Workshop Item
author	A. S. A., Sani F. J. P., Sousa Zamzuri, Hamedon Azmir, Azhari
author_facet	A. S. A., Sani F. J. P., Sousa Zamzuri, Hamedon Azmir, Azhari
author_sort	A. S. A., Sani
title	Contact Pressure Distribution During the Polishing Process of Ceramic Tiles: A Laboratory Investigation
title_short	Contact Pressure Distribution During the Polishing Process of Ceramic Tiles: A Laboratory Investigation
title_full	Contact Pressure Distribution During the Polishing Process of Ceramic Tiles: A Laboratory Investigation
title_fullStr	Contact Pressure Distribution During the Polishing Process of Ceramic Tiles: A Laboratory Investigation
title_full_unstemmed	Contact Pressure Distribution During the Polishing Process of Ceramic Tiles: A Laboratory Investigation
title_sort	contact pressure distribution during the polishing process of ceramic tiles: a laboratory investigation
publisher	IOP Publishing
publishDate	2016
url	http://umpir.ump.edu.my/id/eprint/14756/ http://umpir.ump.edu.my/id/eprint/14756/ http://umpir.ump.edu.my/id/eprint/14756/ http://umpir.ump.edu.my/id/eprint/14756/1/fkp-2016-asas-contact%20pressure%20distribution%20during%20the%20polishing.pdf
first_indexed	2023-09-18T22:18:51Z
last_indexed	2023-09-18T22:18:51Z
_version_	1777415520792870912

Contact Pressure Distribution During the Polishing Process of Ceramic Tiles: A Laboratory Investigation

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