Optimization of Chemical Pretreatment for Removing Cobalt on Tungsten Carbide Substrate Using Response Surface Methodology

Diamond coating are commonly used in industries especially for application such as cutting tools, biomedical components, optical lenses, microelectronics, engineering, and thermal management systems. The diamond coating quality is strongly depending on substrate preparation prior to diamond coating....

Full description

Bibliographic Details
Main Authors:	A., Shah, Sudin, Izman, Mas Ayu, Hassan, Ramlee, Mustapha
Format:	Article
Language:	English English
Published:	Penerbit Universiti Teknologi Malaysia 2016
Subjects:	TJ Mechanical engineering and machinery
Online Access:	http://umpir.ump.edu.my/id/eprint/13435/ http://umpir.ump.edu.my/id/eprint/13435/ http://umpir.ump.edu.my/id/eprint/13435/ http://umpir.ump.edu.my/id/eprint/13435/1/Optimization%20of%20Chemical%20Pretreatment%20For%20Removing%20Cobalt%20on%20Tungsten%20Carbide%20Substrate%20Using%20Response%20Surface%20Methodology.pdf http://umpir.ump.edu.my/id/eprint/13435/7/fkm-2016-masayu-Optimization%20of%20Chemical%20Pretreatment%20for.pdf

id	ump-13435
recordtype	eprints
spelling	ump-134352018-01-31T03:46:54Z http://umpir.ump.edu.my/id/eprint/13435/ Optimization of Chemical Pretreatment for Removing Cobalt on Tungsten Carbide Substrate Using Response Surface Methodology A., Shah Sudin, Izman Mas Ayu, Hassan Ramlee, Mustapha TJ Mechanical engineering and machinery Diamond coating are commonly used in industries especially for application such as cutting tools, biomedical components, optical lenses, microelectronics, engineering, and thermal management systems. The diamond coating quality is strongly depending on substrate preparation prior to diamond coating. Thus, the several process parameters must be studied to obtain optimal parameters which lead high quality diamond coating. In this present work, an attempt was made to optimize pretreatment parameters namely temperature and time on cobalt removal of tungsten carbide. Full factorial experimental designs followed by Response Surface Methodology (RSM) were employed in this study to plan and analyze the experiment. The cobalt removal was the independent response variables. Empirical model was successfully developed to predict amount of cobalt removal on the substrate after single step etching process. Experimental results have shown that the temperature, time and time2 are found to be the most significant factors for cobalt removal. Whereas for interaction of time and temperature were insignificant factors to influence cobalt removal. According to this study, the minimum cobalt content can be obtained at working temperature from 48 to 50C for 3 minute. Penerbit Universiti Teknologi Malaysia 2016 Article PeerReviewed application/pdf en http://umpir.ump.edu.my/id/eprint/13435/1/Optimization%20of%20Chemical%20Pretreatment%20For%20Removing%20Cobalt%20on%20Tungsten%20Carbide%20Substrate%20Using%20Response%20Surface%20Methodology.pdf application/pdf en http://umpir.ump.edu.my/id/eprint/13435/7/fkm-2016-masayu-Optimization%20of%20Chemical%20Pretreatment%20for.pdf A., Shah and Sudin, Izman and Mas Ayu, Hassan and Ramlee, Mustapha (2016) Optimization of Chemical Pretreatment for Removing Cobalt on Tungsten Carbide Substrate Using Response Surface Methodology. Jurnal Teknologi (Sciences and Engineering), 78 (5-10). pp. 24-32. ISSN 0127-9696 (print); 2180-3722 (online) http://www.jurnalteknologi.utm.my/index.php/jurnalteknologi/article/view/8830 DOI: org/10.11113/jt.v78.8830
repository_type	Digital Repository
institution_category	Local University
institution	Universiti Malaysia Pahang
building	UMP Institutional Repository
collection	Online Access
language	English English
topic	TJ Mechanical engineering and machinery
spellingShingle	TJ Mechanical engineering and machinery A., Shah Sudin, Izman Mas Ayu, Hassan Ramlee, Mustapha Optimization of Chemical Pretreatment for Removing Cobalt on Tungsten Carbide Substrate Using Response Surface Methodology
description	Diamond coating are commonly used in industries especially for application such as cutting tools, biomedical components, optical lenses, microelectronics, engineering, and thermal management systems. The diamond coating quality is strongly depending on substrate preparation prior to diamond coating. Thus, the several process parameters must be studied to obtain optimal parameters which lead high quality diamond coating. In this present work, an attempt was made to optimize pretreatment parameters namely temperature and time on cobalt removal of tungsten carbide. Full factorial experimental designs followed by Response Surface Methodology (RSM) were employed in this study to plan and analyze the experiment. The cobalt removal was the independent response variables. Empirical model was successfully developed to predict amount of cobalt removal on the substrate after single step etching process. Experimental results have shown that the temperature, time and time2 are found to be the most significant factors for cobalt removal. Whereas for interaction of time and temperature were insignificant factors to influence cobalt removal. According to this study, the minimum cobalt content can be obtained at working temperature from 48 to 50C for 3 minute.
format	Article
author	A., Shah Sudin, Izman Mas Ayu, Hassan Ramlee, Mustapha
author_facet	A., Shah Sudin, Izman Mas Ayu, Hassan Ramlee, Mustapha
author_sort	A., Shah
title	Optimization of Chemical Pretreatment for Removing Cobalt on Tungsten Carbide Substrate Using Response Surface Methodology
title_short	Optimization of Chemical Pretreatment for Removing Cobalt on Tungsten Carbide Substrate Using Response Surface Methodology
title_full	Optimization of Chemical Pretreatment for Removing Cobalt on Tungsten Carbide Substrate Using Response Surface Methodology
title_fullStr	Optimization of Chemical Pretreatment for Removing Cobalt on Tungsten Carbide Substrate Using Response Surface Methodology
title_full_unstemmed	Optimization of Chemical Pretreatment for Removing Cobalt on Tungsten Carbide Substrate Using Response Surface Methodology
title_sort	optimization of chemical pretreatment for removing cobalt on tungsten carbide substrate using response surface methodology
publisher	Penerbit Universiti Teknologi Malaysia
publishDate	2016
url	http://umpir.ump.edu.my/id/eprint/13435/ http://umpir.ump.edu.my/id/eprint/13435/ http://umpir.ump.edu.my/id/eprint/13435/ http://umpir.ump.edu.my/id/eprint/13435/1/Optimization%20of%20Chemical%20Pretreatment%20For%20Removing%20Cobalt%20on%20Tungsten%20Carbide%20Substrate%20Using%20Response%20Surface%20Methodology.pdf http://umpir.ump.edu.my/id/eprint/13435/7/fkm-2016-masayu-Optimization%20of%20Chemical%20Pretreatment%20for.pdf
first_indexed	2023-09-18T22:16:04Z
last_indexed	2023-09-18T22:16:04Z
_version_	1777415345308434432

Optimization of Chemical Pretreatment for Removing Cobalt on Tungsten Carbide Substrate Using Response Surface Methodology

Similar Items