High Anatase Rate Titanium Dioxide Coating Deposition by Low Power Microwave Plasma Spray

High Anatase Rate Titanium Dioxide Coating Deposition by Low Power Microwave Plasma Spray

Titanium dioxide is a promising photocatalyst material because of the magnificent properties of this material where it is able to remove the air pollution substance and the deodorizing function. Generally, the deposition method of a titanium dioxide coating is carried out by an organic system binder...

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Main Authors: Ahmad, Redza, Toshiki, Kondo, Toshiaki, Yasui, Masahiro, Fukumoto
Format: Article
Language:English
Published: IOP Publishing 2016
Subjects:
TS Manufactures
Online Access:http://umpir.ump.edu.my/id/eprint/12967/
http://umpir.ump.edu.my/id/eprint/12967/
http://umpir.ump.edu.my/id/eprint/12967/
http://umpir.ump.edu.my/id/eprint/12967/1/High%20Anatase%20Rate%20Titanium%20Dioxide%20Coating%20Deposition%20by%20Low%20Power%20Microwave%20Plasma%20Spray.pdf
id ump-12967
recordtype eprints
spelling ump-129672016-05-04T03:05:58Z http://umpir.ump.edu.my/id/eprint/12967/ High Anatase Rate Titanium Dioxide Coating Deposition by Low Power Microwave Plasma Spray Ahmad, Redza Toshiki, Kondo Toshiaki, Yasui Masahiro, Fukumoto TS Manufactures Titanium dioxide is a promising photocatalyst material because of the magnificent properties of this material where it is able to remove the air pollution substance and the deodorizing function. Generally, the deposition method of a titanium dioxide coating is carried out by an organic system binder but the powerful photocatalytic reaction will degrades the binder. Therefore, thermal spray is considered to be the alternative method but this method will induce crystallization transformation of titanium dioxide from anatase phase with high photocatalytic activity to rutile phase with low photocatalyst which caused by high heat input. Since our microwave plasma spraying device is operable at low power comparing with conventional high power plasma spray, the reduce effect of the heat input onto the particles at the time of spraying can be achieved and coating deposition with high rate of anatase phase is expected. Therefore, in this research, the coating deposition by controlling the heat input into the spray particle which can be resulted in high rate of anatase phase with high photocatalytic activity was conducted. By controlled condition, coating with optimum anatase rate of 83% is able to be fabricated by this method. IOP Publishing 2016 Article PeerReviewed application/pdf en http://umpir.ump.edu.my/id/eprint/12967/1/High%20Anatase%20Rate%20Titanium%20Dioxide%20Coating%20Deposition%20by%20Low%20Power%20Microwave%20Plasma%20Spray.pdf Ahmad, Redza and Toshiki, Kondo and Toshiaki, Yasui and Masahiro, Fukumoto (2016) High Anatase Rate Titanium Dioxide Coating Deposition by Low Power Microwave Plasma Spray. IOP Conference Series: Materials Science and Engineering, 114 (012031). pp. 1-10. ISSN 1757-8981 (Print); 1757-899X (Online) http://dx.doi.org/10.1088/1757-899X/114/1/012031 DOI: 10.1088/1757-899X/114/1/012031
repository_type Digital Repository
institution_category Local University
institution Universiti Malaysia Pahang
building UMP Institutional Repository
collection Online Access
language English
topic TS Manufactures
spellingShingle TS Manufactures
Ahmad, Redza
Toshiki, Kondo
Toshiaki, Yasui
Masahiro, Fukumoto
High Anatase Rate Titanium Dioxide Coating Deposition by Low Power Microwave Plasma Spray
description Titanium dioxide is a promising photocatalyst material because of the magnificent properties of this material where it is able to remove the air pollution substance and the deodorizing function. Generally, the deposition method of a titanium dioxide coating is carried out by an organic system binder but the powerful photocatalytic reaction will degrades the binder. Therefore, thermal spray is considered to be the alternative method but this method will induce crystallization transformation of titanium dioxide from anatase phase with high photocatalytic activity to rutile phase with low photocatalyst which caused by high heat input. Since our microwave plasma spraying device is operable at low power comparing with conventional high power plasma spray, the reduce effect of the heat input onto the particles at the time of spraying can be achieved and coating deposition with high rate of anatase phase is expected. Therefore, in this research, the coating deposition by controlling the heat input into the spray particle which can be resulted in high rate of anatase phase with high photocatalytic activity was conducted. By controlled condition, coating with optimum anatase rate of 83% is able to be fabricated by this method.
format Article
author Ahmad, Redza
Toshiki, Kondo
Toshiaki, Yasui
Masahiro, Fukumoto
author_facet Ahmad, Redza
Toshiki, Kondo
Toshiaki, Yasui
Masahiro, Fukumoto
author_sort Ahmad, Redza
title High Anatase Rate Titanium Dioxide Coating Deposition by Low Power Microwave Plasma Spray
title_short High Anatase Rate Titanium Dioxide Coating Deposition by Low Power Microwave Plasma Spray
title_full High Anatase Rate Titanium Dioxide Coating Deposition by Low Power Microwave Plasma Spray
title_fullStr High Anatase Rate Titanium Dioxide Coating Deposition by Low Power Microwave Plasma Spray
title_full_unstemmed High Anatase Rate Titanium Dioxide Coating Deposition by Low Power Microwave Plasma Spray
title_sort high anatase rate titanium dioxide coating deposition by low power microwave plasma spray
publisher IOP Publishing
publishDate 2016
url http://umpir.ump.edu.my/id/eprint/12967/
http://umpir.ump.edu.my/id/eprint/12967/
http://umpir.ump.edu.my/id/eprint/12967/
http://umpir.ump.edu.my/id/eprint/12967/1/High%20Anatase%20Rate%20Titanium%20Dioxide%20Coating%20Deposition%20by%20Low%20Power%20Microwave%20Plasma%20Spray.pdf
first_indexed 2023-09-18T22:15:03Z
last_indexed 2023-09-18T22:15:03Z
_version_ 1777415281521459200

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