Fabrication of porous ZnO thin films via ammonium hydroxide: effects of etching time and oxidizer on surface morphology and surface roughness

The effects of the etching time and oxidizer on the surface morphology and surface roughness of the porous zinc oxide (ZnO) thin films, which were formed using ammonium hydroxide (NH4OH) were investigated. The etching time was varied from 1 to 5 min. The oxidizer used was hydrogen peroxide (H2O2) s...

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Main Authors:	S.S., Ng, P.K., Ooi, Yaakob, S., Abdullah, M.J., Abu Hassan, H., Hassan, Z.
Format:	Article
Language:	English
Published:	Universiti Kebangsaan Malaysia 2014
Online Access:	http://journalarticle.ukm.my/7264/ http://journalarticle.ukm.my/7264/ http://journalarticle.ukm.my/7264/1/15_S.S._Ng.pdf

id	ukm-7264
recordtype	eprints
spelling	ukm-72642016-12-14T06:43:34Z http://journalarticle.ukm.my/7264/ Fabrication of porous ZnO thin films via ammonium hydroxide: effects of etching time and oxidizer on surface morphology and surface roughness S.S., Ng P.K., Ooi Yaakob, S. Abdullah, M.J. Abu Hassan, H. Hassan, Z. The effects of the etching time and oxidizer on the surface morphology and surface roughness of the porous zinc oxide (ZnO) thin films, which were formed using ammonium hydroxide (NH4OH) were investigated. The etching time was varied from 1 to 5 min. The oxidizer used was hydrogen peroxide (H2O2) solution. The ZnO thin films were obtained using radio- frequency magnetron sputtering on n-type silicon (111) substrate. The thickness of the ZnO thin films was approximately 1.34 μm. The morphology, topography and surface roughness of the porous ZnO were characterized using scanning electron microscope (SEM) and atomic force microscope. The SEM results showed that the surface morphology of the as-grown ZnO film has a leaf-like structure. However, this structure transformed into irregularly shaped pores upon exposure of the ZnO thin films to the etchant solutions. Increased etching time corresponded to increased pore size, which concurrently resulted in the formation of granular ZnO. Finally, it was found that the etching rate increases with the addition of H2O2 in the NH4OH solution. Universiti Kebangsaan Malaysia 2014-07 Article PeerReviewed application/pdf en http://journalarticle.ukm.my/7264/1/15_S.S._Ng.pdf S.S., Ng and P.K., Ooi and Yaakob, S. and Abdullah, M.J. and Abu Hassan, H. and Hassan, Z. (2014) Fabrication of porous ZnO thin films via ammonium hydroxide: effects of etching time and oxidizer on surface morphology and surface roughness. Sains Malaysiana, 43 (7). pp. 1077-1082. ISSN 0126-6039 http://www.ukm.my/jsm/
repository_type	Digital Repository
institution_category	Local University
institution	Universiti Kebangasaan Malaysia
building	UKM Institutional Repository
collection	Online Access
language	English
description	The effects of the etching time and oxidizer on the surface morphology and surface roughness of the porous zinc oxide (ZnO) thin films, which were formed using ammonium hydroxide (NH4OH) were investigated. The etching time was varied from 1 to 5 min. The oxidizer used was hydrogen peroxide (H2O2) solution. The ZnO thin films were obtained using radio- frequency magnetron sputtering on n-type silicon (111) substrate. The thickness of the ZnO thin films was approximately 1.34 μm. The morphology, topography and surface roughness of the porous ZnO were characterized using scanning electron microscope (SEM) and atomic force microscope. The SEM results showed that the surface morphology of the as-grown ZnO film has a leaf-like structure. However, this structure transformed into irregularly shaped pores upon exposure of the ZnO thin films to the etchant solutions. Increased etching time corresponded to increased pore size, which concurrently resulted in the formation of granular ZnO. Finally, it was found that the etching rate increases with the addition of H2O2 in the NH4OH solution.
format	Article
author	S.S., Ng P.K., Ooi Yaakob, S. Abdullah, M.J. Abu Hassan, H. Hassan, Z.
spellingShingle	S.S., Ng P.K., Ooi Yaakob, S. Abdullah, M.J. Abu Hassan, H. Hassan, Z. Fabrication of porous ZnO thin films via ammonium hydroxide: effects of etching time and oxidizer on surface morphology and surface roughness
author_facet	S.S., Ng P.K., Ooi Yaakob, S. Abdullah, M.J. Abu Hassan, H. Hassan, Z.
author_sort	S.S., Ng
title	Fabrication of porous ZnO thin films via ammonium hydroxide: effects of etching time and oxidizer on surface morphology and surface roughness
title_short	Fabrication of porous ZnO thin films via ammonium hydroxide: effects of etching time and oxidizer on surface morphology and surface roughness
title_full	Fabrication of porous ZnO thin films via ammonium hydroxide: effects of etching time and oxidizer on surface morphology and surface roughness
title_fullStr	Fabrication of porous ZnO thin films via ammonium hydroxide: effects of etching time and oxidizer on surface morphology and surface roughness
title_full_unstemmed	Fabrication of porous ZnO thin films via ammonium hydroxide: effects of etching time and oxidizer on surface morphology and surface roughness
title_sort	fabrication of porous zno thin films via ammonium hydroxide: effects of etching time and oxidizer on surface morphology and surface roughness
publisher	Universiti Kebangsaan Malaysia
publishDate	2014
url	http://journalarticle.ukm.my/7264/ http://journalarticle.ukm.my/7264/ http://journalarticle.ukm.my/7264/1/15_S.S._Ng.pdf
first_indexed	2023-09-18T19:49:11Z
last_indexed	2023-09-18T19:49:11Z
_version_	1777406104760745984

Fabrication of porous ZnO thin films via ammonium hydroxide: effects of etching time and oxidizer on surface morphology and surface roughness

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