Effects of the nitric acid concentrations on the etching process, structural and optical properties of porous zinc oxide thin films

The present study reports on the fabrication of porous zinc oxide by wet chemical etching. ZnO thin films were deposited via radio-frequency magnetron sputtering on p-type silicon with (111) preferred orientation. The etchants used in the present work were 0.1% and 1.0% nitric acid (HNO3) solutions....

Full description

Bibliographic Details
Main Authors:	C.G., Ching, Leonard, Lu, C.I., Ang, P.K., Ooi, S.S., Ng, Z., Hassan, H., Abu Hassan
Format:	Article
Language:	English
Published:	Universiti Kebangsaan Malaysia 2013
Online Access:	http://journalarticle.ukm.my/6476/ http://journalarticle.ukm.my/6476/ http://journalarticle.ukm.my/6476/1/17_C.G._Ching.pdf

id	ukm-6476
recordtype	eprints
spelling	ukm-64762016-12-14T06:41:18Z http://journalarticle.ukm.my/6476/ Effects of the nitric acid concentrations on the etching process, structural and optical properties of porous zinc oxide thin films C.G., Ching Leonard, Lu C.I., Ang P.K., Ooi S.S., Ng Z., Hassan H., Abu Hassan The present study reports on the fabrication of porous zinc oxide by wet chemical etching. ZnO thin films were deposited via radio-frequency magnetron sputtering on p-type silicon with (111) preferred orientation. The etchants used in the present work were 0.1% and 1.0% nitric acid (HNO3) solutions. ZnO were etched at various times and were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and photoluminescence (PL) spectroscopy to allow the examination of their structural and optical properties. The XRD results revealed that the intensity of ZnO(002) decreased when the thin films were etched in varying HNO3 concentrations over different periods of time. The above observation is attributed to the dissolution of the ZnO(002). The SEM images showed that the thickness of the ZnO layers decreased over the etching time, which resulted from the isotropic etching by the HNO3 solution. The PL emission intensity initially increased with increasing etching time. However, with further etching of the samples, the PL spectra showed a decreasing trend in intensity as a result of the decrease in the surface-to-volume ratio. All results lead to the conclusion that 1.0% HNO3 has the capability to change the ZnO surface significantly. Universiti Kebangsaan Malaysia 2013-09 Article PeerReviewed application/pdf en http://journalarticle.ukm.my/6476/1/17_C.G._Ching.pdf C.G., Ching and Leonard, Lu and C.I., Ang and P.K., Ooi and S.S., Ng and Z., Hassan and H., Abu Hassan (2013) Effects of the nitric acid concentrations on the etching process, structural and optical properties of porous zinc oxide thin films. Sains Malaysiana, 42 (9). pp. 1327-1332. ISSN 0126-6039 http://www.ukm.my/jsm/
repository_type	Digital Repository
institution_category	Local University
institution	Universiti Kebangasaan Malaysia
building	UKM Institutional Repository
collection	Online Access
language	English
description	The present study reports on the fabrication of porous zinc oxide by wet chemical etching. ZnO thin films were deposited via radio-frequency magnetron sputtering on p-type silicon with (111) preferred orientation. The etchants used in the present work were 0.1% and 1.0% nitric acid (HNO3) solutions. ZnO were etched at various times and were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and photoluminescence (PL) spectroscopy to allow the examination of their structural and optical properties. The XRD results revealed that the intensity of ZnO(002) decreased when the thin films were etched in varying HNO3 concentrations over different periods of time. The above observation is attributed to the dissolution of the ZnO(002). The SEM images showed that the thickness of the ZnO layers decreased over the etching time, which resulted from the isotropic etching by the HNO3 solution. The PL emission intensity initially increased with increasing etching time. However, with further etching of the samples, the PL spectra showed a decreasing trend in intensity as a result of the decrease in the surface-to-volume ratio. All results lead to the conclusion that 1.0% HNO3 has the capability to change the ZnO surface significantly.
format	Article
author	C.G., Ching Leonard, Lu C.I., Ang P.K., Ooi S.S., Ng Z., Hassan H., Abu Hassan
spellingShingle	C.G., Ching Leonard, Lu C.I., Ang P.K., Ooi S.S., Ng Z., Hassan H., Abu Hassan Effects of the nitric acid concentrations on the etching process, structural and optical properties of porous zinc oxide thin films
author_facet	C.G., Ching Leonard, Lu C.I., Ang P.K., Ooi S.S., Ng Z., Hassan H., Abu Hassan
author_sort	C.G., Ching
title	Effects of the nitric acid concentrations on the etching process, structural and optical properties of porous zinc oxide thin films
title_short	Effects of the nitric acid concentrations on the etching process, structural and optical properties of porous zinc oxide thin films
title_full	Effects of the nitric acid concentrations on the etching process, structural and optical properties of porous zinc oxide thin films
title_fullStr	Effects of the nitric acid concentrations on the etching process, structural and optical properties of porous zinc oxide thin films
title_full_unstemmed	Effects of the nitric acid concentrations on the etching process, structural and optical properties of porous zinc oxide thin films
title_sort	effects of the nitric acid concentrations on the etching process, structural and optical properties of porous zinc oxide thin films
publisher	Universiti Kebangsaan Malaysia
publishDate	2013
url	http://journalarticle.ukm.my/6476/ http://journalarticle.ukm.my/6476/ http://journalarticle.ukm.my/6476/1/17_C.G._Ching.pdf
first_indexed	2023-09-18T19:47:02Z
last_indexed	2023-09-18T19:47:02Z
_version_	1777405968623075328

Effects of the nitric acid concentrations on the etching process, structural and optical properties of porous zinc oxide thin films

Similar Items