Reflectance characteristics of silicon surface fabricated with the arrays of uniform inverted pyramid microstructures in UV-visible range

In this paper, inverted pyramidal microstructures are designed and fabricated on silicon (Si) surface. The characteristics of surface reflectance are simulated using two-dimensional (2D) finite-difference time-domain (FDTD) method by varying the spacing (S) and width (W) of the pyramidal microstruct...

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Main Authors:	Mohd Faizol Abdullah, Abdul Manaf Hashim
Format:	Article
Language:	English
Published:	Penerbit Universiti Kebangsaan Malaysia 2019
Online Access:	http://journalarticle.ukm.my/13707/ http://journalarticle.ukm.my/13707/ http://journalarticle.ukm.my/13707/1/02%20Mohd%20Faizol%20Abdullah.pdf

id	ukm-13707
recordtype	eprints
spelling	ukm-137072019-11-29T08:54:44Z http://journalarticle.ukm.my/13707/ Reflectance characteristics of silicon surface fabricated with the arrays of uniform inverted pyramid microstructures in UV-visible range Mohd Faizol Abdullah, Abdul Manaf Hashim, In this paper, inverted pyramidal microstructures are designed and fabricated on silicon (Si) surface. The characteristics of surface reflectance are simulated using two-dimensional (2D) finite-difference time-domain (FDTD) method by varying the spacing (S) and width (W) of the pyramidal microstructures. The results showed that the effect of S is more significant compared to W where the reflectance of the irradiated light has been increased gradually with the increase of S from 0 to 3 μm, and the difference is around 9.6%. Due to the etching constraint, S= 3 μm is chosen for the fabrication. Textured structure is fabricated by the anisotropic etching of tetramethyl-ammonium hydroxide (TMAH) with additional of isopropyl alcohol (IPA). Long etching time of 120 min is required to form uniform arrays of pyramidal microstructures with smooth and well-terminated four sidewalls at (111) plane. Due to the undercut etching under SiO2 mask, it results to the formation of slightly larger W and smaller S in the fabricated structures. The measured average reflectance in UV-visible range for the Si with inverted pyramidal microstructures is very low down to 10.4%. The discrepancy between the measured and simulated values is speculated to be due to the use of 2D FDTD instead of three-dimensional (3D) FDTD. Penerbit Universiti Kebangsaan Malaysia 2019-06 Article PeerReviewed application/pdf en http://journalarticle.ukm.my/13707/1/02%20Mohd%20Faizol%20Abdullah.pdf Mohd Faizol Abdullah, and Abdul Manaf Hashim, (2019) Reflectance characteristics of silicon surface fabricated with the arrays of uniform inverted pyramid microstructures in UV-visible range. Sains Malaysiana, 48 (6). pp. 1163-1169. ISSN 0126-6039 http://www.ukm.my/jsm/malay_journals/jilid48bil6_2019/KandunganJilid48Bil6_2019.html
repository_type	Digital Repository
institution_category	Local University
institution	Universiti Kebangasaan Malaysia
building	UKM Institutional Repository
collection	Online Access
language	English
description	In this paper, inverted pyramidal microstructures are designed and fabricated on silicon (Si) surface. The characteristics of surface reflectance are simulated using two-dimensional (2D) finite-difference time-domain (FDTD) method by varying the spacing (S) and width (W) of the pyramidal microstructures. The results showed that the effect of S is more significant compared to W where the reflectance of the irradiated light has been increased gradually with the increase of S from 0 to 3 μm, and the difference is around 9.6%. Due to the etching constraint, S= 3 μm is chosen for the fabrication. Textured structure is fabricated by the anisotropic etching of tetramethyl-ammonium hydroxide (TMAH) with additional of isopropyl alcohol (IPA). Long etching time of 120 min is required to form uniform arrays of pyramidal microstructures with smooth and well-terminated four sidewalls at (111) plane. Due to the undercut etching under SiO2 mask, it results to the formation of slightly larger W and smaller S in the fabricated structures. The measured average reflectance in UV-visible range for the Si with inverted pyramidal microstructures is very low down to 10.4%. The discrepancy between the measured and simulated values is speculated to be due to the use of 2D FDTD instead of three-dimensional (3D) FDTD.
format	Article
author	Mohd Faizol Abdullah, Abdul Manaf Hashim,
spellingShingle	Mohd Faizol Abdullah, Abdul Manaf Hashim, Reflectance characteristics of silicon surface fabricated with the arrays of uniform inverted pyramid microstructures in UV-visible range
author_facet	Mohd Faizol Abdullah, Abdul Manaf Hashim,
author_sort	Mohd Faizol Abdullah,
title	Reflectance characteristics of silicon surface fabricated with the arrays of uniform inverted pyramid microstructures in UV-visible range
title_short	Reflectance characteristics of silicon surface fabricated with the arrays of uniform inverted pyramid microstructures in UV-visible range
title_full	Reflectance characteristics of silicon surface fabricated with the arrays of uniform inverted pyramid microstructures in UV-visible range
title_fullStr	Reflectance characteristics of silicon surface fabricated with the arrays of uniform inverted pyramid microstructures in UV-visible range
title_full_unstemmed	Reflectance characteristics of silicon surface fabricated with the arrays of uniform inverted pyramid microstructures in UV-visible range
title_sort	reflectance characteristics of silicon surface fabricated with the arrays of uniform inverted pyramid microstructures in uv-visible range
publisher	Penerbit Universiti Kebangsaan Malaysia
publishDate	2019
url	http://journalarticle.ukm.my/13707/ http://journalarticle.ukm.my/13707/ http://journalarticle.ukm.my/13707/1/02%20Mohd%20Faizol%20Abdullah.pdf
first_indexed	2023-09-18T20:05:27Z
last_indexed	2023-09-18T20:05:27Z
_version_	1777407127977984000

Reflectance characteristics of silicon surface fabricated with the arrays of uniform inverted pyramid microstructures in UV-visible range

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