Novel nanofabrication process of oxide patterns using AFM in low operating temperature: a promising lithographic tool for future molecular electronics
Field-induced oxidation has become a promising process that is capable of directly producing high-resolution surface oxide patterns on variety materials. In this report, a low temperature operation of an atomic force microscope (AFM) was used to condense ambient humidity to perform a thin frozen wat...
| Main Authors: | , , , |
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| Format: | Conference or Workshop Item |
| Language: | English |
| Published: |
2007
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| Subjects: | |
| Online Access: | http://irep.iium.edu.my/9447/ http://irep.iium.edu.my/9447/1/AGUS_-_Proc_ICEEI-2007.pdf |
| Summary: | Field-induced oxidation has become a promising process that is capable of directly producing high-resolution surface oxide patterns on variety materials. In this report, a low temperature operation of an atomic force microscope (AFM) was used to condense ambient humidity to perform a thin frozen water layer covering a silicon wafer surface. A scanning probe was contacted with the layer and a zero bias voltage was applied to the probe tip. The frozen water film acted both as an electrolyte for forming the oxides and as a resource of hydroxide. Using this technique, a consistency in height of about 6 nm silicon dioxide patterns layer
could be achieved. |
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