Effect of high temperature chemical etching on surface roughness of tungsten carbide substrate

High hardness, lower thermal expansion and friction coefficient, chemical inertness and strength are the most important characteristics of cutting tools, which can be enhanced by coating the tool surface with a thin layer of diamond. A variety of surface pretreatment methods have been developed to e...

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Main Authors:	Sudin, Izman, Mohd. Yusof, Noordin, Safari, Habib, Engku Abu Bakar, Engku Mohd Nazim, Aluwi Shakir, Noor Adila, Konneh, Mohamed
Format:	Conference or Workshop Item
Language:	English
Published:	2010
Subjects:	Q Science (General)
Online Access:	http://irep.iium.edu.my/7724/ http://irep.iium.edu.my/7724/ http://irep.iium.edu.my/7724/1/549_Izman_et_al.pdf

id	iium-7724
recordtype	eprints
spelling	iium-77242011-12-01T08:10:26Z http://irep.iium.edu.my/7724/ Effect of high temperature chemical etching on surface roughness of tungsten carbide substrate Sudin, Izman Mohd. Yusof, Noordin Safari, Habib Engku Abu Bakar, Engku Mohd Nazim Aluwi Shakir, Noor Adila Konneh, Mohamed Q Science (General) High hardness, lower thermal expansion and friction coefficient, chemical inertness and strength are the most important characteristics of cutting tools, which can be enhanced by coating the tool surface with a thin layer of diamond. A variety of surface pretreatment methods have been developed to enhance diamond nucleation rate density and adhesion strength between diamond films and substrates which include scratching, seeding, electrical biasing, pulsed laser irradiation, interlayer, ion implantation, carburization and chemical pretreatment. Among them, chemical pretreatment is the simplest and cheapest. In this paper, a single step chemical pretreatment using mixture of sulfuric acid and hydrogen peroxide solutions were carried out on tungsten carbide with 6% cobalt (WC-6% Co). Three independent variables such as concentration of sulfuric acid, etching temperature and time were varied to investigate the best combination of these parameters for roughening the WC-6% Co surface. It was found that the highest surface roughness (Ra=1.3μm) was obtained when using 95% concentration of sulfuric acid, and lower etching temperature of 40oC in duration of two minutes etching time. 2010 Conference or Workshop Item PeerReviewed application/pdf en http://irep.iium.edu.my/7724/1/549_Izman_et_al.pdf Sudin, Izman and Mohd. Yusof, Noordin and Safari, Habib and Engku Abu Bakar, Engku Mohd Nazim and Aluwi Shakir, Noor Adila and Konneh, Mohamed (2010) Effect of high temperature chemical etching on surface roughness of tungsten carbide substrate. In: 11th Asia Pacific Industrial Engineering and Management Systems (APIEMS) Conference, 7-10 Dec 2010, Melaka, Malaysia. (In Press) http://www.apiems2010.um.edu.my/
repository_type	Digital Repository
institution_category	Local University
institution	International Islamic University Malaysia
building	IIUM Repository
collection	Online Access
language	English
topic	Q Science (General)
spellingShingle	Q Science (General) Sudin, Izman Mohd. Yusof, Noordin Safari, Habib Engku Abu Bakar, Engku Mohd Nazim Aluwi Shakir, Noor Adila Konneh, Mohamed Effect of high temperature chemical etching on surface roughness of tungsten carbide substrate
description	High hardness, lower thermal expansion and friction coefficient, chemical inertness and strength are the most important characteristics of cutting tools, which can be enhanced by coating the tool surface with a thin layer of diamond. A variety of surface pretreatment methods have been developed to enhance diamond nucleation rate density and adhesion strength between diamond films and substrates which include scratching, seeding, electrical biasing, pulsed laser irradiation, interlayer, ion implantation, carburization and chemical pretreatment. Among them, chemical pretreatment is the simplest and cheapest. In this paper, a single step chemical pretreatment using mixture of sulfuric acid and hydrogen peroxide solutions were carried out on tungsten carbide with 6% cobalt (WC-6% Co). Three independent variables such as concentration of sulfuric acid, etching temperature and time were varied to investigate the best combination of these parameters for roughening the WC-6% Co surface. It was found that the highest surface roughness (Ra=1.3μm) was obtained when using 95% concentration of sulfuric acid, and lower etching temperature of 40oC in duration of two minutes etching time.
format	Conference or Workshop Item
author	Sudin, Izman Mohd. Yusof, Noordin Safari, Habib Engku Abu Bakar, Engku Mohd Nazim Aluwi Shakir, Noor Adila Konneh, Mohamed
author_facet	Sudin, Izman Mohd. Yusof, Noordin Safari, Habib Engku Abu Bakar, Engku Mohd Nazim Aluwi Shakir, Noor Adila Konneh, Mohamed
author_sort	Sudin, Izman
title	Effect of high temperature chemical etching on surface roughness of tungsten carbide substrate
title_short	Effect of high temperature chemical etching on surface roughness of tungsten carbide substrate
title_full	Effect of high temperature chemical etching on surface roughness of tungsten carbide substrate
title_fullStr	Effect of high temperature chemical etching on surface roughness of tungsten carbide substrate
title_full_unstemmed	Effect of high temperature chemical etching on surface roughness of tungsten carbide substrate
title_sort	effect of high temperature chemical etching on surface roughness of tungsten carbide substrate
publishDate	2010
url	http://irep.iium.edu.my/7724/ http://irep.iium.edu.my/7724/ http://irep.iium.edu.my/7724/1/549_Izman_et_al.pdf
first_indexed	2023-09-18T20:17:15Z
last_indexed	2023-09-18T20:17:15Z
_version_	1777407869801463808

Effect of high temperature chemical etching on surface roughness of tungsten carbide substrate

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