Development of a high hertz-stress contact for conventional batch production using a unique scribing technology

Gradually the electronic devices are getting more compact dimension with respect to the width and thickness. As a result, the contacts are becoming thinner and which leads the contact to be loose and unstable contact. In comercial stamping methode, connector tip diameter should be more than 300μm du...

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Main Authors:	Bhuiyan, Moinul, Alamgir, Tarik Bin, Bhuiyan, Munira, Kajihara, Masanori
Format:	Article
Language:	English
Published:	IOP Publishing 2013
Subjects:	TA401 Materials of engineering and construction
Online Access:	http://irep.iium.edu.my/34442/ http://irep.iium.edu.my/34442/ http://irep.iium.edu.my/34442/ http://irep.iium.edu.my/34442/1/Development_of_a_high_hertz-stress_contact_for_conventional_batch_production_using_a_unique_scribing_technology.pdf

id	iium-34442
recordtype	eprints
spelling	iium-344422014-07-03T07:40:31Z http://irep.iium.edu.my/34442/ Development of a high hertz-stress contact for conventional batch production using a unique scribing technology Bhuiyan, Moinul Alamgir, Tarik Bin Bhuiyan, Munira Kajihara, Masanori TA401 Materials of engineering and construction Gradually the electronic devices are getting more compact dimension with respect to the width and thickness. As a result, the contacts are becoming thinner and which leads the contact to be loose and unstable contact. In comercial stamping methode, connector tip diameter should be more than 300μm due to its size limitation. Consequently, the connector contact resistance is becoming higher due to weak contact force. To overcome this problem there were few more basic research using MEMS and Electro Fine Forming (EFF) technology to make high Hertz-Stress Contact (5μm) due to the limitation in the commercial stamping process and the result was in satisfactory level. However, since the MEMS and EFF fabrication is costly therefore, a new method is introduced in this paper using the commercial Phosphor Bronze stamping method to reduce the production cost. Moreover, scribing method is used to make tip on the contact. Accordingly, more compact fine pitch contact is successfully fabricated and tested with 5μm High Hertz Stress without using the MEMS and EFF technology. Hence the manufactured contact resistance becomes less than 20mΩ ±5mΩ. IOP Publishing 2013 Article PeerReviewed application/pdf en http://irep.iium.edu.my/34442/1/Development_of_a_high_hertz-stress_contact_for_conventional_batch_production_using_a_unique_scribing_technology.pdf Bhuiyan, Moinul and Alamgir, Tarik Bin and Bhuiyan, Munira and Kajihara, Masanori (2013) Development of a high hertz-stress contact for conventional batch production using a unique scribing technology. IOP Conference Series: Materials Science and Engineering, 53 (012068). ISSN 1757-8981 http://iopscience.iop.org/1757-899X/53/1/012068 doi:10.1088/1757-899X/53/1/012068
repository_type	Digital Repository
institution_category	Local University
institution	International Islamic University Malaysia
building	IIUM Repository
collection	Online Access
language	English
topic	TA401 Materials of engineering and construction
spellingShingle	TA401 Materials of engineering and construction Bhuiyan, Moinul Alamgir, Tarik Bin Bhuiyan, Munira Kajihara, Masanori Development of a high hertz-stress contact for conventional batch production using a unique scribing technology
description	Gradually the electronic devices are getting more compact dimension with respect to the width and thickness. As a result, the contacts are becoming thinner and which leads the contact to be loose and unstable contact. In comercial stamping methode, connector tip diameter should be more than 300μm due to its size limitation. Consequently, the connector contact resistance is becoming higher due to weak contact force. To overcome this problem there were few more basic research using MEMS and Electro Fine Forming (EFF) technology to make high Hertz-Stress Contact (5μm) due to the limitation in the commercial stamping process and the result was in satisfactory level. However, since the MEMS and EFF fabrication is costly therefore, a new method is introduced in this paper using the commercial Phosphor Bronze stamping method to reduce the production cost. Moreover, scribing method is used to make tip on the contact. Accordingly, more compact fine pitch contact is successfully fabricated and tested with 5μm High Hertz Stress without using the MEMS and EFF technology. Hence the manufactured contact resistance becomes less than 20mΩ ±5mΩ.
format	Article
author	Bhuiyan, Moinul Alamgir, Tarik Bin Bhuiyan, Munira Kajihara, Masanori
author_facet	Bhuiyan, Moinul Alamgir, Tarik Bin Bhuiyan, Munira Kajihara, Masanori
author_sort	Bhuiyan, Moinul
title	Development of a high hertz-stress contact for conventional batch production using a unique scribing technology
title_short	Development of a high hertz-stress contact for conventional batch production using a unique scribing technology
title_full	Development of a high hertz-stress contact for conventional batch production using a unique scribing technology
title_fullStr	Development of a high hertz-stress contact for conventional batch production using a unique scribing technology
title_full_unstemmed	Development of a high hertz-stress contact for conventional batch production using a unique scribing technology
title_sort	development of a high hertz-stress contact for conventional batch production using a unique scribing technology
publisher	IOP Publishing
publishDate	2013
url	http://irep.iium.edu.my/34442/ http://irep.iium.edu.my/34442/ http://irep.iium.edu.my/34442/ http://irep.iium.edu.my/34442/1/Development_of_a_high_hertz-stress_contact_for_conventional_batch_production_using_a_unique_scribing_technology.pdf
first_indexed	2023-09-18T20:49:38Z
last_indexed	2023-09-18T20:49:38Z
_version_	1777409907506544640

Development of a high hertz-stress contact for conventional batch production using a unique scribing technology

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