Design and fabrication stable LNF contact for future IC application

Enable the design of a small contact spring for applications requiring high density, high speed and high durability. A low normal force (LNF) contact spring with high performance is fabricated using a unique combined MEMS photo resist lithography and electro fine forming (EFF) technology. Reducing a...

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Main Authors:	Bhuiyan, Moinul, Rashid, Muhammad Mahbubur, Ahmed, Sayem, Bhuiyan, Munira, Kajihara, Masanori
Format:	Article
Language:	English
Published:	IOP Publishing 2013
Subjects:	TA174 Engineering design
Online Access:	http://irep.iium.edu.my/34439/ http://irep.iium.edu.my/34439/ http://irep.iium.edu.my/34439/ http://irep.iium.edu.my/34439/1/Design_and_fabrication_stable_LNF_contact_for_future_IC_application.pdf

id	iium-34439
recordtype	eprints
spelling	iium-344392014-07-03T07:35:05Z http://irep.iium.edu.my/34439/ Design and fabrication stable LNF contact for future IC application Bhuiyan, Moinul Rashid, Muhammad Mahbubur Ahmed, Sayem Bhuiyan, Munira Kajihara, Masanori TA174 Engineering design Enable the design of a small contact spring for applications requiring high density, high speed and high durability. A low normal force (LNF) contact spring with high performance is fabricated using a unique combined MEMS photo resist lithography and electro fine forming (EFF) technology. Reducing a total contact material cost of a connector, a high-Hertz stress with LNF contact will be a key technology in the future. Only radius R 5m tip with 0.1N force contact provides an excellent electrical performance which is much sharper than conventional contact. 0.30million cycle’s durability test was passed at 300m displacement and the contact resistance was ≦50mΩ. IOP Publishing 2013 Article PeerReviewed application/pdf en http://irep.iium.edu.my/34439/1/Design_and_fabrication_stable_LNF_contact_for_future_IC_application.pdf Bhuiyan, Moinul and Rashid, Muhammad Mahbubur and Ahmed, Sayem and Bhuiyan, Munira and Kajihara, Masanori (2013) Design and fabrication stable LNF contact for future IC application. IOP Conference Series: Materials Science and Engineering, 53 (012060). ISSN 1757-8981 http://iopscience.iop.org/1757-899X/53/1/012060 doi:10.1088/1757-899X/53/1/012060
repository_type	Digital Repository
institution_category	Local University
institution	International Islamic University Malaysia
building	IIUM Repository
collection	Online Access
language	English
topic	TA174 Engineering design
spellingShingle	TA174 Engineering design Bhuiyan, Moinul Rashid, Muhammad Mahbubur Ahmed, Sayem Bhuiyan, Munira Kajihara, Masanori Design and fabrication stable LNF contact for future IC application
description	Enable the design of a small contact spring for applications requiring high density, high speed and high durability. A low normal force (LNF) contact spring with high performance is fabricated using a unique combined MEMS photo resist lithography and electro fine forming (EFF) technology. Reducing a total contact material cost of a connector, a high-Hertz stress with LNF contact will be a key technology in the future. Only radius R 5m tip with 0.1N force contact provides an excellent electrical performance which is much sharper than conventional contact. 0.30million cycle’s durability test was passed at 300m displacement and the contact resistance was ≦50mΩ.
format	Article
author	Bhuiyan, Moinul Rashid, Muhammad Mahbubur Ahmed, Sayem Bhuiyan, Munira Kajihara, Masanori
author_facet	Bhuiyan, Moinul Rashid, Muhammad Mahbubur Ahmed, Sayem Bhuiyan, Munira Kajihara, Masanori
author_sort	Bhuiyan, Moinul
title	Design and fabrication stable LNF contact for future IC application
title_short	Design and fabrication stable LNF contact for future IC application
title_full	Design and fabrication stable LNF contact for future IC application
title_fullStr	Design and fabrication stable LNF contact for future IC application
title_full_unstemmed	Design and fabrication stable LNF contact for future IC application
title_sort	design and fabrication stable lnf contact for future ic application
publisher	IOP Publishing
publishDate	2013
url	http://irep.iium.edu.my/34439/ http://irep.iium.edu.my/34439/ http://irep.iium.edu.my/34439/ http://irep.iium.edu.my/34439/1/Design_and_fabrication_stable_LNF_contact_for_future_IC_application.pdf
first_indexed	2023-09-18T20:49:38Z
last_indexed	2023-09-18T20:49:38Z
_version_	1777409907067191296

Design and fabrication stable LNF contact for future IC application

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