LNF Micro-Contact using MEMS and EFF Technology

Enable the design of a small contact spring for applications requiring high density, high speed and high durability. A low normal force (LNF) contact spring with high performance is fabricated using a unique combined MEMS photo resist lithography and electro fine forming (EFF) technology. Reducing a...

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Bibliographic Details
Main Authors: Bhuiyan, Moinul, Takemasa, Eiichiro, Bhuiyan, Munira
Format: Conference or Workshop Item
Language:English
Published: 2013
Subjects:
Online Access:http://irep.iium.edu.my/33439/
http://irep.iium.edu.my/33439/
http://irep.iium.edu.my/33439/1/LNF_Micro_Contact_using_MEMS_and_EFF_Technology_IRIIE2013.pdf
Description
Summary:Enable the design of a small contact spring for applications requiring high density, high speed and high durability. A low normal force (LNF) contact spring with high performance is fabricated using a unique combined MEMS photo resist lithography and electro fine forming (EFF) technology. Reducing a total contact material cost of a connector, a high-Hertz stress with LNF contact will be a key technology in the future. Only radius r5m tip with 0.1N force contact provides an excellent electrical performance which is much sharper than conventional contact. 0.30million cycles durability test was passed at 300m displacement and the contact resistance was ≦50mΩ.