Surface roughness of sputtered silicon. II. Model verification
Experimental verification of the mathematical surface roughness model for sputtered silicon was performed. The beam shape and its significant level of intensity were determined first by measuring the topography of craters sputtered by focused ion beam (FIB). Then the beam function was generated for...
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| Language: | English |
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Taylor and Francis Inc.
2001
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| Online Access: | http://irep.iium.edu.my/27112/ http://irep.iium.edu.my/27112/ http://irep.iium.edu.my/27112/ http://irep.iium.edu.my/27112/1/024_MaMP_2001_16%283%29_315-329.pdf |
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iium-27112 |
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eprints |
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iium-271122013-07-23T07:39:55Z http://irep.iium.edu.my/27112/ Surface roughness of sputtered silicon. II. Model verification Ali, Mohammad Yeakub Hung, NguyenPhu TS Manufactures Experimental verification of the mathematical surface roughness model for sputtered silicon was performed. The beam shape and its significant level of intensity were determined first by measuring the topography of craters sputtered by focused ion beam (FIB). Then the beam function was generated for various combinations of beam parameters. The material function was developed both by theoretical and experimental analysis. These two functions were then used in the model to calculate the theoretical surface roughness. Microsurface analysis was formed by FIB sputtering of a (100) silicon wafer. The surface roughness at the bottom of the sputtered features was then measured using an atomic force microscope. The theoretical surface roughness was found to be within ±1 and ±5 nm of the measured surface roughness with the measurement uncertainty (standard deviation) of about ±0.36 and ±0.85 nm for R a and R t, respectively. Taylor and Francis Inc. 2001 Article PeerReviewed application/pdf en http://irep.iium.edu.my/27112/1/024_MaMP_2001_16%283%29_315-329.pdf Ali, Mohammad Yeakub and Hung, NguyenPhu (2001) Surface roughness of sputtered silicon. II. Model verification. Materials and Manufacturing Processes, 16 (3). pp. 315-329. ISSN 1042-6914 http://www.tandfonline.com/doi/full/10.1081/AMP-100107376#.Ue4xGdJHIrU 10.1081/AMP-100107377 |
| repository_type |
Digital Repository |
| institution_category |
Local University |
| institution |
International Islamic University Malaysia |
| building |
IIUM Repository |
| collection |
Online Access |
| language |
English |
| topic |
TS Manufactures |
| spellingShingle |
TS Manufactures Ali, Mohammad Yeakub Hung, NguyenPhu Surface roughness of sputtered silicon. II. Model verification |
| description |
Experimental verification of the mathematical surface roughness model for sputtered silicon was performed. The beam shape and its significant level of intensity were determined first by measuring the topography of craters sputtered by focused ion beam (FIB). Then the beam function was generated for various combinations of beam parameters. The material function was developed both by theoretical and experimental analysis. These two functions were then used in the model to calculate the theoretical surface roughness. Microsurface analysis was formed by FIB sputtering of a (100) silicon wafer. The surface roughness at the bottom of the sputtered features was then measured using an atomic force microscope. The theoretical surface roughness was found to be within ±1 and ±5 nm of the measured surface roughness with the measurement uncertainty (standard deviation) of about ±0.36 and ±0.85 nm for R a and R t, respectively. |
| format |
Article |
| author |
Ali, Mohammad Yeakub Hung, NguyenPhu |
| author_facet |
Ali, Mohammad Yeakub Hung, NguyenPhu |
| author_sort |
Ali, Mohammad Yeakub |
| title |
Surface roughness of sputtered silicon. II. Model verification |
| title_short |
Surface roughness of sputtered silicon. II. Model verification |
| title_full |
Surface roughness of sputtered silicon. II. Model verification |
| title_fullStr |
Surface roughness of sputtered silicon. II. Model verification |
| title_full_unstemmed |
Surface roughness of sputtered silicon. II. Model verification |
| title_sort |
surface roughness of sputtered silicon. ii. model verification |
| publisher |
Taylor and Francis Inc. |
| publishDate |
2001 |
| url |
http://irep.iium.edu.my/27112/ http://irep.iium.edu.my/27112/ http://irep.iium.edu.my/27112/ http://irep.iium.edu.my/27112/1/024_MaMP_2001_16%283%29_315-329.pdf |
| first_indexed |
2023-09-18T20:40:19Z |
| last_indexed |
2023-09-18T20:40:19Z |
| _version_ |
1777409320846098432 |