Surface roughness of sputtered silicon. I. surface modeling

A mathematical model for the calculation of surface roughness was developed for focused ion beam (FIB) sputtering. The surface roughness function is a combination of the beam function and the material function. The beam function includes ion type, ion acceleration energy, and beam parameters. Fur...

Full description

Bibliographic Details
Main Authors: Ali, Mohammad Yeakub, Hung, N. P.
Format: Article
Language:English
Published: Taylor & Francis 2001
Subjects:
Online Access:http://irep.iium.edu.my/27111/
http://irep.iium.edu.my/27111/1/023_MaMP_2001_16%283%29_297-313.pdf
id iium-27111
recordtype eprints
spelling iium-271112013-06-26T01:25:02Z http://irep.iium.edu.my/27111/ Surface roughness of sputtered silicon. I. surface modeling Ali, Mohammad Yeakub Hung, N. P. TS Manufactures A mathematical model for the calculation of surface roughness was developed for focused ion beam (FIB) sputtering. The surface roughness function is a combination of the beam function and the material function. The beam function includes ion type, ion acceleration energy, and beam parameters. Furthermore, the beam parameter incorporates ion flux, the ion beam intensity distribution profile, tailing and neighboring of the successive beams, dwell time, etc. The intensity distribution inside the ion beam is considered to be Gaussian. The cumulative intensity over the total milling area is calculated by the algebraic summation of individual beam intensity delivered to every pixel successively. The material function includes the inherent material properties related to the ion beam micromachining. If one knows the beam function and material function, surface roughness at the bottom of the sputtered features can be calculated using this model. Taylor & Francis 2001 Article PeerReviewed application/pdf en http://irep.iium.edu.my/27111/1/023_MaMP_2001_16%283%29_297-313.pdf Ali, Mohammad Yeakub and Hung, N. P. (2001) Surface roughness of sputtered silicon. I. surface modeling. Materials and Manufacturing Processes, 16 (3). pp. 297-313. ISSN 1532-2475 (O), 1042-6914 (P)
repository_type Digital Repository
institution_category Local University
institution International Islamic University Malaysia
building IIUM Repository
collection Online Access
language English
topic TS Manufactures
spellingShingle TS Manufactures
Ali, Mohammad Yeakub
Hung, N. P.
Surface roughness of sputtered silicon. I. surface modeling
description A mathematical model for the calculation of surface roughness was developed for focused ion beam (FIB) sputtering. The surface roughness function is a combination of the beam function and the material function. The beam function includes ion type, ion acceleration energy, and beam parameters. Furthermore, the beam parameter incorporates ion flux, the ion beam intensity distribution profile, tailing and neighboring of the successive beams, dwell time, etc. The intensity distribution inside the ion beam is considered to be Gaussian. The cumulative intensity over the total milling area is calculated by the algebraic summation of individual beam intensity delivered to every pixel successively. The material function includes the inherent material properties related to the ion beam micromachining. If one knows the beam function and material function, surface roughness at the bottom of the sputtered features can be calculated using this model.
format Article
author Ali, Mohammad Yeakub
Hung, N. P.
author_facet Ali, Mohammad Yeakub
Hung, N. P.
author_sort Ali, Mohammad Yeakub
title Surface roughness of sputtered silicon. I. surface modeling
title_short Surface roughness of sputtered silicon. I. surface modeling
title_full Surface roughness of sputtered silicon. I. surface modeling
title_fullStr Surface roughness of sputtered silicon. I. surface modeling
title_full_unstemmed Surface roughness of sputtered silicon. I. surface modeling
title_sort surface roughness of sputtered silicon. i. surface modeling
publisher Taylor & Francis
publishDate 2001
url http://irep.iium.edu.my/27111/
http://irep.iium.edu.my/27111/1/023_MaMP_2001_16%283%29_297-313.pdf
first_indexed 2023-09-18T20:40:18Z
last_indexed 2023-09-18T20:40:18Z
_version_ 1777409320687763456