An alternative polymeric protection mask for bulk KOH etching of silicon

The utilization of a newly developed photosensitive polymeric coating, ProTEK PSB plays a significant role in realizing simple process steps in the fabrication of MEMS devices using bulk micromachining technology. The photosensitive coating serves as an alternative to the conventional silicon n...

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Main Authors:	Ab. Rahim, Rosminazuin, Bais, Badariah, Yeop Majlis, Burhanuddin, Sugandi, Gandi
Format:	Conference or Workshop Item
Language:	English
Published:	2012
Subjects:	TP1080 Polymers, plastics and their manufacture
Online Access:	http://irep.iium.edu.my/24999/ http://irep.iium.edu.my/24999/ http://irep.iium.edu.my/24999/1/an_alternative_polymeric.pdf

id	iium-24999
recordtype	eprints
spelling	iium-249992012-08-02T05:55:35Z http://irep.iium.edu.my/24999/ An alternative polymeric protection mask for bulk KOH etching of silicon Ab. Rahim, Rosminazuin Bais, Badariah Yeop Majlis, Burhanuddin Sugandi, Gandi TP1080 Polymers, plastics and their manufacture The utilization of a newly developed photosensitive polymeric coating, ProTEK PSB plays a significant role in realizing simple process steps in the fabrication of MEMS devices using bulk micromachining technology. The photosensitive coating serves as an alternative to the conventional silicon nitride mask of bulk KOH etching in devising MEMS devices, particularly suspended microcantilever structure. Although the coating is an excellent outer protective layer from any pinhole issues, the lateral etching in KOH solution is prominent, which results in an undercut issue. Therefore, the combination of ProTEK PSB and thermal oxide layer was studied for its possibility in obtaining minimum undercut-etch depth ratio of the polymeric coating in KOH (45%wt, 80oC). The combination of ProTEK PSB patterned on thermal oxide results in an effective etching condition attributed by minimum undercut ratio with respect to the etch depth. 2012-07-12 Conference or Workshop Item PeerReviewed application/pdf en http://irep.iium.edu.my/24999/1/an_alternative_polymeric.pdf Ab. Rahim, Rosminazuin and Bais, Badariah and Yeop Majlis, Burhanuddin and Sugandi, Gandi (2012) An alternative polymeric protection mask for bulk KOH etching of silicon. In: 2012 Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS (DTIP), 25-27 April 2012, Cannes, France. http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=6235295
repository_type	Digital Repository
institution_category	Local University
institution	International Islamic University Malaysia
building	IIUM Repository
collection	Online Access
language	English
topic	TP1080 Polymers, plastics and their manufacture
spellingShingle	TP1080 Polymers, plastics and their manufacture Ab. Rahim, Rosminazuin Bais, Badariah Yeop Majlis, Burhanuddin Sugandi, Gandi An alternative polymeric protection mask for bulk KOH etching of silicon
description	The utilization of a newly developed photosensitive polymeric coating, ProTEK PSB plays a significant role in realizing simple process steps in the fabrication of MEMS devices using bulk micromachining technology. The photosensitive coating serves as an alternative to the conventional silicon nitride mask of bulk KOH etching in devising MEMS devices, particularly suspended microcantilever structure. Although the coating is an excellent outer protective layer from any pinhole issues, the lateral etching in KOH solution is prominent, which results in an undercut issue. Therefore, the combination of ProTEK PSB and thermal oxide layer was studied for its possibility in obtaining minimum undercut-etch depth ratio of the polymeric coating in KOH (45%wt, 80oC). The combination of ProTEK PSB patterned on thermal oxide results in an effective etching condition attributed by minimum undercut ratio with respect to the etch depth.
format	Conference or Workshop Item
author	Ab. Rahim, Rosminazuin Bais, Badariah Yeop Majlis, Burhanuddin Sugandi, Gandi
author_facet	Ab. Rahim, Rosminazuin Bais, Badariah Yeop Majlis, Burhanuddin Sugandi, Gandi
author_sort	Ab. Rahim, Rosminazuin
title	An alternative polymeric protection mask for bulk KOH etching of silicon
title_short	An alternative polymeric protection mask for bulk KOH etching of silicon
title_full	An alternative polymeric protection mask for bulk KOH etching of silicon
title_fullStr	An alternative polymeric protection mask for bulk KOH etching of silicon
title_full_unstemmed	An alternative polymeric protection mask for bulk KOH etching of silicon
title_sort	alternative polymeric protection mask for bulk koh etching of silicon
publishDate	2012
url	http://irep.iium.edu.my/24999/ http://irep.iium.edu.my/24999/ http://irep.iium.edu.my/24999/1/an_alternative_polymeric.pdf
first_indexed	2023-09-18T20:37:23Z
last_indexed	2023-09-18T20:37:23Z
_version_	1777409136284139520

An alternative polymeric protection mask for bulk KOH etching of silicon

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